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ScN/sub x/ gate on atomic layer deposited HfO/sub 2/ and effect of high-pressure wet post deposition annealing

✍ Scribed by Hyundoek Yang; Dongsoo Lee; M. Rahman; M. Hasan; Hyung-seok Jung; Hyunsang Hwang

Book ID: 126738461
Publisher: IEEE
Year: 2006
Tongue: English
Weight: 385 KB
Volume: 27
Category: Article
ISSN: 0741-3106
DOI: 10.1109/LED.2006.874129

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