Impact of the Deposition and Annealing Temperature on the Silicon Surface Passivation of ALD Al2O3 Films

✍ Scribed by S. Bordihn; I. Kiesow; V. Mertens; P. Engelhart; J.W. MŸller; W.M.M. Kessels

• Book ID: 116427182
• Publisher: Elsevier
• Year: 2012
• Weight: 360 KB
• Volume: 27
• Category: Article
• ISSN: 1876-6102
• DOI: 10.1016/j.egypro.2012.07.083