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Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

✍ Scribed by Rafí, J. M.; Zabala, M.; Beldarrain, O.; Campabadal, F.

Book ID
125510533
Publisher
The Electrochemical Society
Year
2011
Tongue
English
Weight
851 KB
Volume
158
Category
Article
ISSN
0013-4651

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