✦ LIBER ✦

Physical properties and electrical characteristics of H2O-based and O3-based HfO2 films deposited by ALD

✍ Scribed by Jibin Fan; Hongxia Liu; Qianwei Kuang; Bo Gao; Fei Ma; Yue Hao

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Deposition of HfO2, Gd2O3 and PrOx by Li

✍ R. J. Potter; P. R. Chalker; T. D. Manning; H. C. Aspinall; Y. F. Loo; A. C. Jon 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 607 KB

Structure and properties of films based

✍ L. V. Yakovkina; T. P. Smirnova; V. O. Borisov; S. Jeong-Hwan; N. B. Morozova; V 📂 Article 📅 2011 🏛 SP MAIK Nauka/Interperiodica 🌐 English ⚖ 226 KB

HfO[sub 2] Films Grown by ALD Using Cycl

✍ Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri; Arstila, Kai; Sajavaara, T 📂 Article 📅 2006 🏛 The Electrochemical Society 🌐 English ⚖ 517 KB

Interface and material characterization

✍ Gosset, L. G. (author);Damlencourt, J. F. (author);Renault, O. (author);Rouchon, 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 354 KB

Interface and material characterization

✍ Gosset, L. G. (author);Damlencourt, J. F. (author);Renault, O. (author);Rouchon, 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 354 KB

Improved interfacial and electrical prop

✍ Li, Xue-Fei; Liu, Xiao-Jie; Cao, Yan-Qiang; Li, Ai-Dong; Li, Hui; Wu, Di 📂 Article 📅 2013 🏛 Elsevier Science 🌐 English ⚖ 637 KB