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HfO[sub 2] Films Grown by ALD Using Cyclopentadienyl-Type Precursors and H[sub 2]O or O[sub 3] as Oxygen Source

✍ Scribed by Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri; Arstila, Kai; Sajavaara, Timo; Lu, Jun; Kukli, Kaupo; Ritala, Mikko; Leskelä, Markku

Book ID: 125850004
Publisher: The Electrochemical Society
Year: 2006
Tongue: English
Weight: 517 KB
Volume: 153
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.2162447

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