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Effects of annealing temperature on the characteristics of HfSi[sub x]O[sub y]/HfO[sub 2] high-k gate oxides

✍ Scribed by Kim, H. D.; Roh, Y.; Lee, Y.; Lee, J. E.; Jung, D.; Lee, N.-E.

Book ID: 121228717
Publisher: AVS (American Vacuum Society)
Year: 2004
Tongue: English
Weight: 684 KB
Volume: 22
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.1743119

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