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Improved thermal stability of Al[sub 2]O[sub 3]/HfO[sub 2]/Al[sub 2]O[sub 3] high-k gate dielectric stack on GaAs

✍ Scribed by Suh, Dong Chan; Cho, Young Dae; Kim, Sun Wook; Ko, Dae-Hong; Lee, Yongshik; Cho, Mann-Ho; Oh, Jungwoo

Book ID: 121719212
Publisher: American Institute of Physics
Year: 2010
Tongue: English
Weight: 758 KB
Volume: 96
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.3377915

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