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[IEEE Proceedings of International Reliability Physics Symposium - Dallas, TX, USA (1996.04.30-1996.05.2)] Proceedings of International Reliability Physics Symposium RELPHY-96 - Electric field dependent dielectric breakdown of intrinsic SiO/sub 2/ films under dynamic stress

โœ Scribed by Chaparala, P.; Suehle, J.S.; Messick, C.; Roush, M.


Book ID
126702645
Publisher
IEEE
Year
1996
Weight
590 KB
Category
Article
ISBN-13
9780780327535

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