The value of in situ monitoring to study growth dynamics and surface reaction kinetics in a gas source molecular beam epitaxy process is illustrated with reference to the growth of Si ยฎlms on Si(001) substrates using a beam of disilane (Si 2 H 6 ). By using a combination of reยฏection high-energy ele
โฆ LIBER โฆ
Heterointerface Control and Epitaxial Growth of 3C-SiC on Si by Gas Source Molecular Beam Epitaxy
โ Scribed by T. Fuyuki; T. Hatayama; H. Matsunami
- Publisher
- John Wiley and Sons
- Year
- 1997
- Tongue
- English
- Weight
- 600 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0370-1972
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