Hall hole mobility in boron-doped homoepitaxial diamond
✍ Scribed by Pernot, J.; Volpe, P. N.; Omnès, F.; Muret, P.; Teraji, T.
- Book ID
- 111868030
- Publisher
- The American Physical Society
- Year
- 2010
- Tongue
- English
- Weight
- 332 KB
- Volume
- 81
- Category
- Article
- ISSN
- 1098-0121
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
## Abstract We report a study of boron‐doped diamond epilayers grown on (100) HPHT diamond substrates by microwave plasma chemical vapor deposition (MPCVD) in simultaneous or successive runs. The structural and crystalline quality of the samples have been investigated by several techniques. The pro
## Abstract The crystallinity and built‐in strain of diamond epilayers grown by MPCVD with boron contents __n__~B~ varying from 2 × 10^20^ to 2 × 10^21^ cm^–3^ as evaluated by SIMS are assessed by HR‐XR Diffraction. Both ac transport and ac susceptibility measurements show that the critical concent