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Growth of HfO2 by Liquid Injection MOCVD and ALD Using New Hafnium-Cyclopentadienyl Precursors

✍ Scribed by R. O'Kane; J. Gaskell; A. C. Jones; P. R. Chalker; K. Black; M. Werner; P. Taechakumput; S. Taylor; P. N. Heys; R. Odedra

Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
650 KB
Volume
13
Category
Article
ISSN
0948-1907

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Liquid injection MOCVD and ALD of ZrO2 u
Liquid injection MOCVD and ALD of ZrO2 using Zr–cyclopentadienyl precursors
✍ Jeffrey M. Gaskell; Anthony C. Jones; Kate Black; Paul R. Chalker; Thomas Leese; 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 268 KB

Thin films of ZrO 2 have been deposited by liquid injection MOCVD and ALD using the cyclopentadienyl-based Zr precursors [(MeCp) 2 ZrMe (OMe)] and [(MeCp) 2 ZrMe(OBu t )]. Analysis by X-ray diffraction showed that films grown at low temperature (300 °C) by ALD were amorphous, whist films deposited a