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Growth of Hafnium Dioxide Thin Films by Liquid-Injection MOCVD Using Alkylamide and Hydroxylamide Precursors

✍ Scribed by P.A. Williams; A.C. Jones; N.L. Tobin; P.R. Chalker; S. Taylor; P.A. Marshall; J.F. Bickley; L.M. Smith; H.O. Davies; G.W. Critchlow

Publisher: John Wiley and Sons
Year: 2003
Tongue: English
Weight: 290 KB
Volume: 9
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200306271

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