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Growth of Hafnium Aluminate Thin Films by Liquid Injection MOCVD Using Alkoxide Precursors

✍ Scribed by P.A. Marshall; R.J. Potter; A.C. Jones; P.R. Chalker; S. Taylor; G.W. Critchlow; S.A. Rushworth

Publisher: John Wiley and Sons
Year: 2004
Tongue: English
Weight: 322 KB
Volume: 10
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200306301

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