Deposition of HfO2 Films by Liquid Injection MOCVD Using a New Monomeric Alkoxide Precursor, [Hf(dmop)4]

✍ Scribed by Y. F. Loo; R. O'Kane; A. C. Jones; H. C. Aspinall; R. J. Potter; P. R. Chalker; J. F. Bickley; S. Taylor; L. M. Smith

• Publisher: John Wiley and Sons
• Year: 2005
• Tongue: English
• Weight: 440 KB
• Volume: 11
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/cvde.200506384