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ChemInform Abstract: Growth of HfO2 by Liquid Injection MOCVD and ALD Using New Hafnium-Cyclopentadienyl Precursors.

✍ Scribed by Ruairi O'Kane; Jeffrey Gaskell; Anthony C. Jones; Paul R. Chalker; Kate Black; Matthew Werner; Pouvanart Taechakumput; Stephen Taylor; Peter N. Heys; Rajesh Odedra

Publisher: John Wiley and Sons
Year: 2008
Weight: 24 KB
Volume: 39
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.200807212

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