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Formation of silicon nitride films by remote plasma-enhanced chemical vapour deposition

✍ Scribed by Sergei E. Alexandrov; Michael L. Hitchman; Sarkis Shamlian

Book ID: 111997763
Publisher: John Wiley and Sons
Year: 1993
Tongue: English
Weight: 993 KB
Volume: 2
Category: Article
ISSN: 1616-301X
DOI: 10.1002/amo.860020605

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