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Final polishing of Ga-polar GaN substrates using reactive ion etching

✍ Scribed by F. Karouta; J. L. Weyher; B. Jacobs; G. Nowak; A. Presz; I. Grzegory; L. M. F. Kaufmann

Book ID: 107457944
Publisher: Springer US
Year: 1999
Tongue: English
Weight: 252 KB
Volume: 28
Category: Article
ISSN: 0361-5235
DOI: 10.1007/s11664-999-0139-2

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