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Enhanced oxygen diffusion in highly doped p-type Czochralski silicon

✍ Scribed by Murphy, J. D.; Wilshaw, P. R.; Pygall, B. C.; Senkader, S.; Falster, R. J.

Book ID: 120372007
Publisher: American Institute of Physics
Year: 2006
Tongue: English
Weight: 368 KB
Volume: 100
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.2369536

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