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Electrical Characteristics of Metal-Oxide-Semiconductor Device with Sc Gate on Atomic-Layer-Deposited HfO 2

✍ Scribed by Yang, Hyundoek; Park, Hokyung; Lee, Dongsoo; Choi, Sangmoo; Hwang, Hyunsang

Book ID: 127115996
Publisher: Institute of Pure and Applied Physics
Year: 2005
Tongue: English
Weight: 213 KB
Volume: 44
Category: Article
ISSN: 0021-4922
DOI: 10.1143/jjap.44.l1275

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