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Effect of the deposition gas pressure on the structure and mechanical stability of sputtered amorphous carbon nitride films

✍ Scribed by S. Peponas; M. Lejeune; S. Charvet; M. Guedda; M. Benlahsen

Book ID
119374184
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
710 KB
Volume
212
Category
Article
ISSN
0257-8972

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Effects of deposition temperature on the
Effects of deposition temperature on the structure of amorphous carbon nitride films
✍ M. Therasse; M. Benlahsen πŸ“‚ Article πŸ“… 2004 πŸ› Elsevier Science 🌐 English βš– 134 KB

Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character