Effects of deposition temperature on the
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M. Therasse; M. Benlahsen
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Article
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2004
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Elsevier Science
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English
โ 134 KB
Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character