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Annealing effects on the microstructure of amorphous carbon nitride films

โœ Scribed by X.C. Wang; Z.Q. Li; P. Wu; E.Y. Jiang; H.L. Bai

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
928 KB
Volume
253
Category
Article
ISSN
0169-4332

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Optical properties of plasma deposited amorphous carbon nitride films on polymer substrates
โœ S.H. Mohamed; F.M. El-Hossary; G.A. Gamal; M.M. Kahlid ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 299 KB

Amorphous carbon nitride thin films were deposited on polymer substrates using radio frequency (rf) plasma in a mixture of nitrogen (N 2 ) and acetylene (C 2 H 2 ) gasses. The samples were prepared at different rf plasma power (350, 400, 450, 500, and 550 W), at constant plasma exposure time of 10 m