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Effect of bias voltage on the properties of hydrogenated amorphous carbon films fabricated on CoCrMo alloy by electron cyclotron resonance plasma enhance chemical vapor deposition (ECR-PECVD)

โœ Scribed by Xingrui Deng; Y.X. Leng; H.Sun; Nan Huang


Book ID
113846535
Publisher
Elsevier
Year
2011
Tongue
English
Weight
442 KB
Volume
18
Category
Article
ISSN
1875-3892

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Effects of process parameters on the str
โœ Dong Xie; Hengjun Liu; Xingrui Deng; Y.X. Leng; Nan Huang ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 450 KB

The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o