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Effect of hydrogen flow on the properties of hydrogenated amorphous carbon films fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition

✍ Scribed by X.R. Deng; Y.X. Leng; X. Dong; H. Sun; Nan Huang

Book ID
113919451
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
811 KB
Volume
206
Category
Article
ISSN
0257-8972

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The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o