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Plasma treatment effects on hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition

โœ Scribed by Jun Wu; Ying-Lang Wang; Cheng-Tzu Kuo

Book ID
108191425
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
410 KB
Volume
69
Category
Article
ISSN
0022-3697

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The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o