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Annealing effects in amorphous hydrogenated carbon films prepared by plasma deposition from butane gas

โœ Scribed by Yasuda, K. ;Masuda, H. ;Takeda, M. ;Yoshida, A.


Publisher
John Wiley and Sons
Year
1986
Tongue
English
Weight
298 KB
Volume
95
Category
Article
ISSN
0031-8965

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The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o