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The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

✍ Scribed by Hae-Yeol Kim; Ki-Young Lee; Jai-Young Lee

Book ID: 108389079
Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 589 KB
Volume: 302
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(96)09573-9

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