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Effects of microwave power and bias voltage on deposition of amorphous hydrogenated carbon films using electron cyclotron resonance plasma chemical vapour deposition

✍ Scribed by K. Maruyama; T. Inoue; M. Yamamoto; T. Morinaga; H. Saitoh; K. Kamata

Publisher: Springer
Year: 1994
Tongue: English
Weight: 327 KB
Volume: 13
Category: Article
ISSN: 0261-8028
DOI: 10.1007/bf00776361

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