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Effects of applied power on hydrogenated amorphous carbon (a-C:H) film deposition by low frequency (60 Hz) plasma-enhanced chemical vapor deposition (PECVD)

✍ Scribed by Hong Tak Kim; Sang Ho Sohn

Book ID: 116965195
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 420 KB
Volume: 86
Category: Article
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2012.06.007

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