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Effect of Radio Frequency Power on the Properties of Hydrogenated Amorphous Carbon Films Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

✍ Scribed by Hayashi, Yasuhiko; Hagimoto, Kouji; Ebisu, Hiroshi; Kalaga, Murali Krishna; Soga, Tetsuo; Umeno, Masayoshi; Jimbo, Takashi

Book ID: 121669304
Publisher: Institute of Pure and Applied Physics
Year: 2000
Tongue: English
Weight: 173 KB
Volume: 39
Category: Article
ISSN: 0021-4922
DOI: 10.1143/JJAP.39.4088

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