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Dielectric properties of amorphous hydrogenated silicon carbide thin films grown by plasma-enhanced chemical vapor deposition

✍ Scribed by Brassard, D.; El Khakani, M. A.

Book ID: 121699238
Publisher: American Institute of Physics
Year: 2003
Tongue: English
Weight: 246 KB
Volume: 93
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.1555676

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