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The deposition of intrinsic hydrogenated amorphous silicon thin films incorporated with oxygen by plasma-enhanced vapor deposition

โœ Scribed by Lee, Ji Eun; Park, Joo Hyung; Yoo, Jinsu; Yoon, Kyung Hoon; Kim, Donghwan; Cho, Jun-Sik

Book ID
121775173
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
395 KB
Volume
20
Category
Article
ISSN
1293-2558

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๐Ÿ“œ SIMILAR VOLUMES

Preparation of hydrogenated amorphous si
Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition
โœ J Huran; J ล afrรกnkovรก; A.P. Kobzev ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 252 KB

Thin silicon carbide (SiCI films were prepared by plasma enhanced chemical vapour deposition PECVDI. The structural properties of Sic films were investigated by IR, RBS, and ERD measurement techniques. The results showed that the films contain the typical features found in hydrogenated amorphous Sic