Economic production of submicron ASICs with laser beam direct write lithography

✍ Scribed by C. Schomburg; B. Höfflinger; R. Springer; R. Wijnaendts-van-Resandt

• Book ID: 104306353
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 299 KB
• Volume: 35
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(96)00197-9

✦ Synopsis

The Heidelberg Instruments Mikrotechnik (HIMT) DWL2.0 direct write laser lithography system is designed to provide cost-effective writing of submicron ASICs using a multi beam 442 nm HeCd laser with acousto-optical micro deflection. During the investigation of the machine performance at the Institute for Microelectronics Stuttgart (IMS) a resolution of 0.8 lam was achieved for irregular patterns. The DWL2.0 was successfully applied for 2.0 Hm, 1.2 lam and 0.8 lam CMOS double metal ASIC personalisations with standard optical resist processes.