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Direct writing laser lithography for production of microstructures

✍ Scribed by H. Ulrich; R.W. Wijnaendts-van-Resandt; C. Rensch; W. Ehrensperger

Book ID
107920339
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
407 KB
Volume
6
Category
Article
ISSN
0167-9317

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The Heidelberg Instruments Mikrotechnik (HIMT) DWL2.0 direct write laser lithography system is designed to provide cost-effective writing of submicron ASICs using a multi beam 442 nm HeCd laser with acousto-optical micro deflection. During the investigation of the machine performance at the Institut