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Dose and implantation temperature influence on extended defects nucleation in c-Si

✍ Scribed by F Schiettekatte; S Roorda; R Poirier; M.O Fortin; S Chazal; R Héliou


Book ID
114172091
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
484 KB
Volume
164-165
Category
Article
ISSN
0168-583X

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