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Dopant behaviour and damage annealing in silicon implanted with 1 keV arsenic

✍ Scribed by S Whelan; V Privitera; G Mannino; M Italia; C Bongiorno; E Napolitani; E.J.H Collart; J.A van den Berg

Book ID: 114165163
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 108 KB
Volume: 186
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(01)00877-1

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