IIIB-9 dopant profile control by rapid thermal annealing in boron and arsenic implanted silicon

✍ Scribed by Narayan, J.; Holland, D.W.; Eby, R.; Wortman, J.J.; Ozguz, V.; Rozgonyi, G.A.

• Book ID: 114594580
• Publisher: IEEE
• Year: 1983
• Tongue: English
• Weight: 107 KB
• Volume: 30
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1983.21373