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Dominant Device Instability Mechanism in Scaled Metal–Oxide–Semiconductor Field-Effect Transistors with Hafnium Oxide Dielectric

✍ Scribed by Choi, Rino; Kim, Tea Wan; Park, Hokyung; Lee, Byoung Hun


Book ID
120229270
Publisher
Institute of Pure and Applied Physics
Year
2009
Tongue
English
Weight
114 KB
Volume
48
Category
Article
ISSN
0021-4922

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