The Electrical and Interfacial Properties of Metal-High-$\kappa$ Oxide-Semiconductor Field-Effect Transistors With $\hbox{LaAlO}_{3}$ Gate Dielectric

✍ Scribed by Chang, I.Y.-K.; Sheng-Wen You, ; Pi-Chun Juan, ; Ming-Tsong Wang, ; Lee, J.Y.-M.

• Book ID: 121698205
• Publisher: IEEE
• Year: 2009
• Tongue: English
• Weight: 204 KB
• Volume: 30
• Category: Article
• ISSN: 0741-3106
• DOI: 10.1109/led.2009.2009554