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Wide-bandgap high-k Y[sub 2]O[sub 3] as passivating interlayer for enhancing the electrical properties and high-field reliability of n-Ge metal-oxide-semiconductor capacitors with high-k HfTiO gate dielectric

✍ Scribed by Li, C. X.; Lai, P. T.


Book ID
120939827
Publisher
American Institute of Physics
Year
2009
Tongue
English
Weight
470 KB
Volume
95
Category
Article
ISSN
0003-6951

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