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Diffusion simulations of boron implanted at low energy (500 eV) in crystalline silicon

โœ Scribed by L. Ihaddadene-Le Coq; J. Marcon; A. Dush-Nicolini; K. Masmoudi; K. Ketata


Book ID
113822698
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
282 KB
Volume
216
Category
Article
ISSN
0168-583X

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