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Atomic transport properties and electrical activation of ultra-low energy implanted boron in crystalline silicon

✍ Scribed by V Privitera; E Napolitani; F Priolo; S Moffatt; A La Magna; G Mannino; A Carnera; A Picariello

Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 368 KB
Volume: 2
Category: Article
ISSN: 1369-8001
DOI: 10.1016/s1369-8001(99)00004-9

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