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Low energy boron implantation in silicon and room temperature diffusion

โœ Scribed by E.J.H Collart; K Weemers; N.E.B Cowern; J Politiek; P.H.L Bancken; J.G.M van Berkum; D.J Gravesteijn


Book ID
114169858
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
277 KB
Volume
139
Category
Article
ISSN
0168-583X

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