Analysis of low energy boron implants in silicon through SiO2 films: implantation damage and anomalous diffusion

✍ Scribed by L. Kaabi; C. Gontrand; B. Remaki; F. Seigneur; B. Balland

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 729 KB
• Volume: 25
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/0026-2692(94)90042-6