𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Diffusion modelling of low-energy ion-implanted BF2 in crystalline silicon: Study of fluorine vacancy effect on boron diffusion

✍ Scribed by J. Marcon; A. Merabet


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
423 KB
Volume
154-155
Category
Article
ISSN
0921-5107

No coin nor oath required. For personal study only.