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Damage induced in Si by ion milling or reactive ion etching

✍ Scribed by Pang, S. W.; Rathman, D. D.; Silversmith, D. J.; Mountain, R. W.; DeGraff, P. D.


Book ID
120417500
Publisher
American Institute of Physics
Year
1983
Tongue
English
Weight
665 KB
Volume
54
Category
Article
ISSN
0021-8979

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