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Reactive ion-etching-induced damage in silicon using SF6 gas mixtures

✍ Scribed by Arora, B. M.

Book ID: 121796564
Publisher: AVS (American Vacuum Society)
Year: 1987
Tongue: English
Weight: 752 KB
Volume: 5
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.583683

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