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A study on the reactive ion etching of SiC single crystals using inductively coupled plasma of SF6-based gas mixtures

โœ Scribed by S. C. Ahn; S. Y. Han; J. L. Lee; J. H. Moon; B. T. Lee


Book ID
105696638
Publisher
TechnoPress
Year
2004
Tongue
English
Weight
262 KB
Volume
10
Category
Article
ISSN
1598-9623

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