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Evaluation of induced damage by CH4/H2 reactive ion etching on InP:n++

✍ Scribed by G. Morello; C. Baron; D. Re; D. Sarocchi; G. Meneghini

Book ID: 114155533
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 273 KB
Volume: 67-68
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(03)00090-x

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