Influence of reactive ion etching damage
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N Fujimura; T Yamaguchi; H Kato; T Ito
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Article
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2000
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Elsevier Science
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English
โ 328 KB
## ลฝ . Change in Schottky barrier height SBH of TirSi surface damaged by CHF rO plasma treatment was investigated as a 3 2 function of annealing temperature. SBH of the damaged interface was initially higher than that of clean interface. The SBH of damaged interface increased with increasing the a