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Effect of reactive ion etch-induced damage on the performance of 4H-SiC schottky barrier diodes

โœ Scribed by V. Khemka; T. P. Chow; R. J. Gutmann


Book ID
107457749
Publisher
Springer US
Year
1998
Tongue
English
Weight
233 KB
Volume
27
Category
Article
ISSN
0361-5235

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Influence of reactive ion etching damage
โœ N Fujimura; T Yamaguchi; H Kato; T Ito ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 328 KB

## ลฝ . Change in Schottky barrier height SBH of TirSi surface damaged by CHF rO plasma treatment was investigated as a 3 2 function of annealing temperature. SBH of the damaged interface was initially higher than that of clean interface. The SBH of damaged interface increased with increasing the a